Author: Thompson, M.O.
Paper Title Page
MOP014 Electroplating of Sn Film on Nb Substrate for Generating Nb3Sn Thin Films and Post Laser Annealing 51
SUSP036   use link to see paper's listing under its alternate paper code  
  • Z. Sun, M. Liepe, T.E. Oseroff, R.D. Porter
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • T. Arias, A.B. Connolly, J.M. Scholtz, N. Sitaraman, M.O. Thompson
    Cornell University, Ithaca, USA
  • X. Deng
    University of Virginia, Charlottesville, Virginia, USA
  • K.D. Dobson
    University of Delaware, Newark, Delaware, USA
  Controlling film quality of Nb3Sn is critical to its SRF cavity performance. The state-of-the-art vapor diffusion approach for Nb3Sn deposition observed surface roughness, thin grain regions, and misfit dislocations which negatively affect the RF performance. The Sn deficiency and non-uniformity at the nucleation stage of vapor deposition is believed to be the fundamental reason to cause these roughness and defects issues. Thus, we propose to pre-deposit a uniform Sn film on the Nb substrate, which is able to provide sufficient Sn source during the following heat treatment for Nb3Sn nucleation and growth. Here, we demonstrated successful electrodeposition of a low-roughness, dendrite-free, excellent-adhesion Sn film on the Nb substrate. More importantly, we further achieved a uniform, low-roughness (Ra = 66 nm), pure-stoichiometric Nb3Sn film through thermal treatment of this electroplated Sn film in the furnace. Additionally, we provide preliminary results of laser annealing as a post treatment for epitaxial grain growth and roughness reduction.  
DOI • reference for this paper ※  
About • paper received ※ 22 June 2019       paper accepted ※ 30 June 2019       issue date ※ 14 August 2019  
Export • reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml)