Author: Elsayed-Ali, H.
Paper Title Page
TUP079 Deposition of Nb3Sn Films by Multilayer Sequential Sputtering for SRF Cavity Application 637
SUSP015   use link to see paper's listing under its alternate paper code  
  • Md.N. Sayeed, H. Elsayed-Ali
    ODU, Norfolk, Virginia, USA
  • M.C. Burton, G.V. Eremeev, C.E. Reece, A-M. Valente-Feliciano
    JLab, Newport News, Virginia, USA
  • U. Pudasaini
    The College of William and Mary, Williamsburg, Virginia, USA
  Nb3Sn is considered as an alternative of Nb for SRF accelerator cavity application due to its potential to obtain higher quality factors and higher accelerating gradients at a higher operating temperature. Magnetron sputtering is one of the effective techniques that can be used to fabricate Nb3Sn on SRF cavity surface. We report on the surface properties of Nb3Sn films fabricated by sputtering multiple layers of Nb and Sn on sapphire and niobium substrates followed by annealing at 950°C for 3 h. The crystal structure, film microstructure, composition and surface roughness were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), and atomic force microscopy (AFM). The RF performance of the Nb3Sn coated Nb substrates were measured by a surface impedance characterization system. We also report on the design of a multilayer sputter deposition system to coat a single-cell SRF cavity.  
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About • paper received ※ 22 June 2019       paper accepted ※ 01 July 2019       issue date ※ 14 August 2019  
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