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RIS citation export for MOP014: Electroplating of Sn Film on Nb Substrate for Generating Nb₃Sn Thin Films and Post Laser Annealing

TY  - CONF
AU  - Sun, Z.
AU  - Arias, T.
AU  - Connolly, A.B.
AU  - Deng, X.
AU  - Dobson, K.D.
AU  - Liepe, M.
AU  - Oseroff, T.E.
AU  - Porter, R.D.
AU  - Scholtz, J.M.
AU  - Sitaraman, N.
AU  - Thompson, M.O.
ED  - Michel, Peter
ED  - Arnold, André
ED  - Schaa, Volker RW
TI  - Electroplating of Sn Film on Nb Substrate for Generating Nb₃Sn Thin Films and Post Laser Annealing
J2  - Proc. of SRF2019, Dresden, Germany, 30 June-05 July 2019
CY  - Dresden, Germany
T2  - International Conference on RF Superconductivity
T3  - 19
LA  - english
AB  - Controlling film quality of Nb₃Sn is critical to its SRF cavity performance. The state-of-the-art vapor diffusion approach for Nb₃Sn deposition observed surface roughness, thin grain regions, and misfit dislocations which negatively affect the RF performance. The Sn deficiency and non-uniformity at the nucleation stage of vapor deposition is believed to be the fundamental reason to cause these roughness and defects issues. Thus, we propose to pre-deposit a uniform Sn film on the Nb substrate, which is able to provide sufficient Sn source during the following heat treatment for Nb₃Sn nucleation and growth. Here, we demonstrated successful electrodeposition of a low-roughness, dendrite-free, excellent-adhesion Sn film on the Nb substrate. More importantly, we further achieved a uniform, low-roughness (Ra = 66 nm), pure-stoichiometric Nb₃Sn film through thermal treatment of this electroplated Sn film in the furnace. Additionally, we provide preliminary results of laser annealing as a post treatment for epitaxial grain growth and roughness reduction.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 51
EP  - 54
KW  - laser
KW  - cavity
KW  - radio-frequency
KW  - electron
KW  - HOM
DA  - 2019/08
PY  - 2019
SN  - 978-3-95450-211-0
DO  - doi:10.18429/JACoW-SRF2019-MOP014
UR  - http://jacow.org/srf2019/papers/mop014.pdf
ER  -